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Endurance improvement due to rapid thermal annealing (RTA) of a TaO (x) thin film in an oxygen ambientGo to Link

Hong, Junghyup; Jang, Woochool; Song, Hyoseok; Kang, Chunho; Jeon, Hyeongtag; Jeon, Heeyoung; Park, Jingyu; Kim, Hyunjung; Kim, Honggi

ArticleIssue Date2015CitationJournal of the Korean Physical Society, v.66, no.5, pp 721 - 725Publisher한국물리학회
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