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Effect of Side Lobe Intensity and Photon Shot Noise Effect on the Missing Hole Phenomenon in Extreme Ultraviolet LithographyGo to Link

Kim, Jung Sik; Hong, Seongchul; Jang, Yong Ju; Ahn, Jinho

ArticleIssue Date2017Citation대한금속·재료학회지, v.55, no.2, pp 139 - 143Publisher대한금속·재료학회
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Improved Margin of Absorber Pattern Sidewall Angle Using Phase Shifting Extreme Ultraviolet MaskGo to Link

Jang, Yong Ju; Kim, Jung Sik; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2016CitationNanoscience and Nanotechnology Letters, v.8, no.7, pp 544 - 548PublisherAmerican Scientific Publishers
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Phase Shift Mask to Compensate for Mask 3D Effect in High-Numerical-Aperture Extreme Ultraviolet LithographyGo to Link

Jang, Yong Ju; Kim, Jung Sik; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2016CitationNanoscience and Nanotechnology Letters, v.8, no.9, pp 729 - 733PublisherAmerican Scientific Publishers
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Sub-Resolution Assist Feature in Attenuated Phase-Shift Mask for Extreme Ultraviolet LithographyGo to Link

Kim, Jung Sik; Hong, Seongchul; Jang, Yong Ju; Ahn, Jinho

ArticleIssue Date2016CitationNanoscience and Nanotechnology Letters, v.8, no.9, pp 739 - 743PublisherAmerican Scientific Publishers
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고 개구수 극자외선 노광 기술용 위상 변위 흡수체 구조의 설계Go to Link

Jang, Yong Ju; Kim, Jung Sik; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2016Citation대한금속·재료학회지, v.54, no.6, pp 455 - 460Publisher대한금속·재료학회
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