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Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopyGo to Link

Lee, Jae Uk; Hong, Seongchul; Ahn, Jinho; Doh, Jonggul; Jeong, SeeJun

ArticleIssue Date2014CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.32, no.3, pp 1 - 6PublisherAmerican Institute of Physics
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Imaging performance of attenuated phase-shift mask using coherent scattering microscopeGo to Link

Lee, Jae Uk; Jeong, SeeJun; Hong, Seong Chul; Lee, Seung Min; Ahn, Jin ho

ArticleIssue Date2014CitationProceedings of SPIE - The International Society for Optical Engineering, v.9048PublisherSPIE
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