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Effect of Attenuated Phase Shift Mask Structure on Extreme Ultraviolet LithographyGo to Link

Shin, Hyun-Duck; Jeoung, Chang Young; Kim, Tae Geun; Lee, Sangsul; Park, In-Sung; Ahn, Jinho

ArticleIssue Date2009CitationJapanese Journal of Applied Physics, v.48, no.6, pp 1 - 4PublisherIOP Publishing Ltd
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