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Boosted growth rate using discrete reactant feeding method and novel precursor of indium oxide by atomic layer depositionGo to Link

Yang, Hae Lin; Kim, Hye-Mi; KAMIMURA, Sunao; EIZAWA, Aya; TERAMOTO, Takashi; DUSSARRAT, Christian; ONO, Takashi; Park, Jin-Seong

ArticleIssue Date2024CitationApplied Surface Science, v.654, pp 1 - 9PublisherElsevier BV
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