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Control of the photoresist etch uniformity in inductive discharge with magnetic resonance wireless power transferGo to Link

Park, Junyoung; Hong, Young-Hun; Kang, Gil-Ho; Kim, Min-Seok; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.2, pp 1 - 13PublisherInstitute of Physics Publishing
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