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Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasmaGo to Link

양혜린; 김태연; 박기범; 윤아라; Song, Ki-cheol; Lee, Yeonhee; Park, Jongryul; Kang, Taehyeong; Park, Yongjoo; Park, Jin-Seong

ArticleIssue Date2023CitationMaterials Science in Semiconductor Processing, v.164, pp 1 - 8PublisherPergamon Press
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