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A Route to MoO2 film fabrication via atomic layer deposition using Mo(IV) precursor and oxygen reactant for DRAM applicationsGo to Link

Yoon, Ara; Yang, Hae Lin; Lee, Sanghoon; Lee, Seunghwan; Kim, Beomseok; Jung, Changhwa; Lim, Hanjin; Park, Jin-Seong

ArticleIssue Date2024CitationCeramics International, v.50, no.8, pp 13841 - 13848PublisherElsevier
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