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Investigation of dual work function metal (DWFM) gate stacks with ALD TaAlN and TaAlC for multi threshold voltages (VTHs) engineering in MOS device integrationGo to Link

Choi, Moonsuk; Sim, Jihyeon; Kim, Hyeongjun; Lim, Hyun Jin; Kim, Ki Sub; Choi, Changhwan

ArticleIssue Date2024CitationMaterials Science in Semiconductor Processing, v.176, pp 1 - 12PublisherPergamon Press
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