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A comparison of Al2O3/HfO2 and Al2O3/ZrO2 bilayers deposited by the atomic layer deposition method for potential gate dielectric applicationsGo to Link

Kim, Inhoe; Koo, Jaehyoung; Lee, Janghee; Jeon, Hyeongtag

ArticleIssue Date2006CitationJapanese Journal of Applied Physics, v.45, no.2A, pp 919 - 925PublisherIOP Publishing Ltd
SCIESCOPUSKCI
Atomic layer deposition of HfO2 thin films on ultrathin SiO2 formed by remote plasma oxidationGo to Link

Kim, Seokhoon; Woo, Sanghyun; Kim, Hyungchul; Kim, Inhoe; Lee, Keunwoo; Jeong, Wooho; Park, Taeyong; Jeon, Hyeongtag

ArticleIssue Date2008CitationJournal of the Korean Physical Society, v.52, no.4, pp 1103 - 1108Publisher한국물리학회
SCOPUS
Chemical and electrical properties of ZnS deposited with DEZ and H 2S by atomic layer deposition methodGo to Link

Kuk, Seoungwoo; Bang, Seokhwan; Kim, Inhoe; Jeon, Sunyeol; Jeon, Hyeongtag; Park, Hyung-Ho; Chang, Ho Jung

ArticleIssue Date2007CitationMaterials Science Forum, v.544-545, pp 689 - 692PublisherTrans Tech Publications Ltd.
SCIESCOPUS
Effect of nitrogen incorporation in HfO2 films deposited by plasma-enhanced atomic layer depositionGo to Link

Lee, Yujin; Kim, Seokhoon; Koo, Jaehyoung; Kim, Inhoe; Choi, Jihoon; Jeon, Hyeongtag; Won, Youngdo

ArticleIssue Date2006CitationJournal of the Electrochemical Society, v.153, no.4, pp G353 - G357PublisherElectrochemical Society, Inc.
SCIESCOPUS
Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer depositionGo to Link

Kim, Inhoe; Kuk, Seoungwoo; Kim, Seokhoon; Kim, Jinwoo; Jeon, Hyeongtag; Cho, MH; Chung, KB

ArticleIssue Date2007CitationApplied Physics Letters, v.90, no.22, pp 1 - 4PublisherAmerican Institute of Physics
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