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SCIESCOPUS
Control of photoresist etch rate via a gradient magnetic field in biased inductively coupled plasmaGo to Link

Jiang, Yi-Lang; Jeong, Yeong Jae; Kim, Jae-Hwi; Kim, Min-Seok; Lee, Myoung-Jae; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.7, pp 1 - 13PublisherInstitute of Physics Publishing
SCIESCOPUS
Low-damage etching of poly-Si and SiO<sub>2</sub> via a low-energy electron beam in inductively coupled CF<sub>4</sub> plasmaGo to Link

Jung, Jiwon; Kim, Jae-Hwi; Lim, Chang-Min; Choi, Jung-Eun; Bae, Junil; Kim, Hyung-Dong; Chung, Chin-Wook

ArticleIssue Date2024CitationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.33, no.10, pp 1 - 10PublisherIOP Publishing Ltd
SCIE
Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etchingGo to Link

Kim, Ju-Ho; Jiang, Yi-Lang; Jeong, Yeong Jae; Kim, Jae-Hwi; Chung, Chin-Wook

ArticleIssue Date2026CitationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.35, no.3, pp 1 - 14PublisherIOP Publishing Ltd
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