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Stochastic resist patterning simulation using attenuated PSM for EUV LithographyGo to Link

Hong, Seongchul; Jeong, Seejun; Lee, Jae Uk; Lee, Seung Min; Kim, Jongseok; Doh, Jonggul; Ahn, Jin ho

ArticleIssue Date2013CitationProceedings of SPIE - The International Society for Optical Engineering, v.8679PublisherSPIE
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