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Ultralow line edge roughness of hybrid multilayer Extreme ultraviolet resist with vertical molecular wire structureGo to Link

Lee, Jaehyuk; Ji, Hyeonseok; Koh, Chawon; Lee, Juyeong; Seok, Ji-Hoo; Ahn, Jinho; Kim, Chang Gyoun; Kim, Jiho; Hwang, Inhui; Ahn, Hyungju, et al.

ArticleIssue Date2025CitationMATERIALS TODAY, v.87, pp 20 - 28PublisherELSEVIER SCI LTD
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