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Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmasGo to Link

Jung, Helen Y.; Park, Ye Rim; Lee, Hack Joo; Lee, Nae-Eung; Jeong, Chan Young; Ahn, Jinho

ArticleIssue Date2009CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.27, no.6, pp 2361 - 2365PublisherAmerican Institute of Physics
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