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Effect of alkaline agent in colloidal silica slurry for polycrystalline silicon chemical mechanical polishingGo to Link

Lee, Myung Yoon; Kang, Hyun Goo; Kanemoto, Manabu; Paik, Ungyu; Park, Jea Gun

ArticleIssue Date2007CitationJapanese Journal of Applied Physics, v.46, no.8A, pp 5089 - 5094PublisherIOP Publishing Ltd
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