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Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasmaGo to Linkopen access

Lee, Nayeon; Kwon, Ohyung; Chung, Chin-Wook

ArticleIssue Date2021CitationAIP ADVANCES, v.11, no.2, pp.1 - 8PublisherAMER INST PHYSICS
SCIESCOPUS
Correlation of SiO2 etch rate in CF4 plasma with electrical circuit parameter obtained from VI probe in inductively coupled plasma etcherGo to Link

Lee, Nayeon; Lee, Woohyun; Kwon, Ohyung; Chung, Chin-Wook

ArticleIssue Date2022CitationJournal of Physics D: Applied Physics, v.55, no.37, pp 1 - 8PublisherIOP Publishing Ltd.
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