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Atomic Layer Etching of SiO2 Utilizing Ultra-Low Electron Temperature Plasma Go to Link

Park, Junyoung; Kim, Nayeon; Choi, Jung-Eun; Yeo, Yujin; Kim, Min-Seok; Lim, Chang-Min; Seo, Beom-Jun; Chung, Chin-Wook

ArticleIssue Date2025CitationACS Applied Electronic Materials, v.7, no.10, pp 4520 - 4528PublisherAmerican Chemical Society

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Damage-Free Plasma Source for Atomic-Scale Processing Go to Link

Park, Junyoung; Jung, Jiwon; Kim, Min-Seok; Lim, Chang-Min; Choi, Jung-Eun; Kim, Nayeon; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2024CitationNano Letters, v.24, no.37, pp 11462 - 11468PublisherAmerican Chemical Society

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Low-damage etching of poly-Si and SiO<sub>2</sub> via a low-energy electron beam in inductively coupled CF<sub>4</sub> plasma Go to Link

Jung, Jiwon; Kim, Jae-Hwi; Lim, Chang-Min; Choi, Jung-Eun; Bae, Junil; Kim, Hyung-Dong; Chung, Chin-Wook

ArticleIssue Date2024CitationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.33, no.10, pp 1 - 10PublisherIOP Publishing Ltd

SCIESCOPUS

Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films Using Ultralow Electron Temperature Plasma

Kim, Min-Seok; Lim, Chang-Min; Kim, Sung Hoon; Kim, Dongmin; Jeon, Hyeongtag; Chung, Chin Wook

ArticleIssue Date2025CitationACS Applied Materials & Interfaces, v.17, no.7, pp 11227 - 11235PublisherAmerican Chemical Society

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Browsing by Lim, Chang-MinAuthor

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