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Stress evolution during the oxidation of silicon nanowires in the sub-10 nm diameter regimeGo to Link

Kim, Byung-Hyun; Pamungkas, Mauludi Ariesto; Park, Mina; Kim, Gyubong; Lee, Kwang-Ryeol; Chung, Yong-Chae

ArticleIssue Date2011CitationApplied Physics Letters, v.99, no.14, pp 1 - 4PublisherAmerican Institute of Physics
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