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A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon–tin oxide by atomic layer depositionGo to Link

Han, Ju-Hwan; Kim, Dong-Yeon; Lee, Seunghwan; Yang, Hae Lin; Park, Byung Ho; Park, Jin-Seong

ArticleIssue Date2021CitationCeramics International, v.47, no.24, pp.34774 - 34782PublisherElsevier Ltd
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