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Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N '-tert-butyl-1,1-dimethylethylenediamine silylene]Go to Link

Lee, Jung Hoon; Kim, Hye Mi; Lee, Seung Hwan; Park, Jung Woo; Park, Jongryul; Park, Jin Seong

ArticleIssue Date2019CitationAPPLIED SURFACE SCIENCE, v.493, pp.125 - 130PublisherELSEVIER
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