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Plasma etching for the application to low-k dielectrics devicesGo to Link

Lee, J.W.; Kim, H.W.; Han, J.W.; Kim, M.-S.; Yoo, B.-D.; Kim, M.-H.; Lee, C.-H.; Lee, C.H.; Lim, C.H.; Hwang, S.-K., et al.

ArticleIssue Date2007CitationMaterials Science Forum, v.555, pp 113 - 118PublisherTrans Tech Publications Ltd.
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