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Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP)Go to Link

Jung, Helen Y.; Park, Ye-Rim; Lee, Hag Joo; Lee, Nae-Eung; Jeong, Chan-Young; Ahn, Jinho

ArticleIssue Date2009CitationThin Solid Films, v.517, no.14, pp 3938 - 3941PublisherElsevier Sequoia
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