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Ozone based high-temperature atomic layer deposition of SiO2 thin filmsGo to Link

Hwang, Su Min; Qin, Zhiyang; Kim, Harrison Sejoon; Ravichandran, Arul; Jung, Yong Chan; Kim, Si Joon; Ahn, Jinho; Hwang, Byung Keun; Kim, Jiyoung

ArticleIssue Date2020CitationJapanese Journal of Applied Physics, v.59, pp 1 - 5PublisherIOP Publishing Ltd
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