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A dry development process for vertically tailored hybrid multilayer EUV photoresist: Chemical Vapor Development (CVD)Go to Link

Seok, Ji-Hoo; Kim, Jiwon; Ji, Hyeonseok; Lee, Jaehyuk; Yoon, Kwangsub; Sung, Myung Mo; Ahn, Jinho

ArticleIssue Date2024CitationProceedings of SPIE - The International Society for Optical Engineering, v.13215, pp 1 - 5PublisherSPIE
SCIESCOPUS
Ultralow line edge roughness of hybrid multilayer Extreme ultraviolet resist with vertical molecular wire structureGo to Link

Lee, Jaehyuk; Ji, Hyeonseok; Koh, Chawon; Lee, Juyeong; Seok, Ji-Hoo; Ahn, Jinho; Kim, Chang Gyoun; Kim, Jiho; Hwang, Inhui; Ahn, Hyungju, et al.

ArticleIssue Date2025CitationMATERIALS TODAY, v.87, pp 20 - 28PublisherELSEVIER SCI LTD
SCIESCOPUS
Vapor-Phase Dry Development of a Nanoscale Zn-Based Metal-Organic Extreme Ultraviolet Photoresist via Surface-Limited β-Diketone Chelation for High-Resolution PatterningGo to Link

Seok, Ji-Hoo; Kim, Jiwon; Ji, Hyeonseok; Lee, Jaehyuk; Lee, Taeho; Yoon, Kwang-Sub; Sung, Myung Mo; Ahn, Jinho

ArticleIssue Date2026CitationACS APPLIED NANO MATERIALS, v.9, no.12, pp 5506 - 5515PublisherAMER CHEMICAL SOC
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