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Micron and submicron patterning of polydimethylsiloxane resists on electronic materials by decal transfer lithography and reactive ion-beam etching: Application to the fabrication of high-mobility, thin-film transistors Go to Link

Ahn, Heejoon; Lee, Keon Jae; Childs, William R.; Rogers, John A.; Nuzzo, Ralph G.; Shim, Anne

ArticleIssue Date2006CitationJournal of Applied Physics, v.100, no.8, pp 084907-1 - 084907-7PublisherAmerican Institute of Physics

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