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Investigation of silicon nitride for spacer via plasma-enhanced atomic layer deposition using a (tert-butylamino)dimethylsilane precursorGo to Link

Park, Chae-Yeon; Yang, Hae Lin; Kim, Hye-Mi; Kim, Daejung; Park, Yongjoo; Park, Jongruyl; Shin, Seokhee; Park, Jin-Seong

ArticleIssue Date2024CitationApplied Surface Science, v.670, pp 1 - 10PublisherElsevier BV
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