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Barrier characteristics of ZrN films deposited by remote plasma-enhanced atomic layer deposition using tetrakis(diethylamino)zirconium precursorGo to Link

Cho, Seungchan; Lee, Keunwoo; Song, Pungkeun; Jeon, Hyeongtag; Kim, Yangdo

ArticleIssue Date2007CitationJapanese Journal of Applied Physics, v.46, no.7A, pp 4085 - 4088PublisherIOP Publishing Ltd
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