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Tailoring indium oxide film characteristics through oxygen reactants in atomic layer deposition with highly reactive liquid precursorGo to Link

Ryu, Seong-Hwan; Hong, TaeHyun; Choi, Su-Hwan; Yeom, Kyuhyun; Won Ryu, Dae; Hyeon Seok, Jang; Park, Jin-Seong

ArticleIssue Date2024CitationApplied Surface Science, v.664, pp 1 - 8PublisherElsevier BV
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