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SCIESCOPUS
Atomic Layer Etching of SiO2 Utilizing Ultra-Low Electron Temperature PlasmaGo to Link

Park, Junyoung; Kim, Nayeon; Choi, Jung-Eun; Yeo, Yujin; Kim, Min-Seok; Lim, Chang-Min; Seo, Beom-Jun; Chung, Chin-Wook

ArticleIssue Date2025CitationACS Applied Electronic Materials, v.7, no.10, pp 4520 - 4528PublisherAmerican Chemical Society
SCIESCOPUS
Electron-kinetic reactor engineering for damage-free, high-selectivity plasma etchingGo to Link

Kim, Min-Seok; Yeo, Yujin; Nahm, Hyeon Ho; Chung, Chin-Wook

ArticleIssue Date2026CitationCHEMICAL ENGINEERING JOURNAL, v.533, pp 1 - 8PublisherELSEVIER SCIENCE SA
SCIESCOPUS
Realizing Vertical Etch Profiles in Fluorine-Rich Ar/CF4 PlasmaGo to Linkopen access

Park, Junyoung; Kim, Nayeon; Choi, Jung-Eun; Yeo, Yujin; Kim, Min-Seok; Seo, Beom-Jun; Chung, Chin-Wook

ArticleIssue Date2026CitationAdvanced Materials Interfaces, v.13, no.1, pp 1 - 9PublisherWILEY
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