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Characteristics of cobalt films deposited by metal organic chemical vapor deposition method using dicobalt hexacarbonyl tert-butylacetyleneGo to Link

Lee, Keunwoo; Park, Taeyong; Lee, Jaesang; Kim, Jinwoo; Kim, Jeongtae; Kwak, Nohjung; Yeom, Seungjin; Jeon, Hyeongtag

ArticleIssue Date2008CitationJapanese Journal of Applied Physics, v.47, no.7, pp 5396 - 5399PublisherIOP Publishing Ltd
SCIESCOPUSKCI
Characteristics of cobalt films deposited by using a remote plasma ALD method with a CpCo(CO)(2) precursorGo to Link

Lee, Keunwoo; Kim, Keunjun; Jeon, Hyeongtag; Lee, Youngjin; Kim, Jeongtae; Yeom, Seungjin

ArticleIssue Date2007CitationJournal of the Korean Physical Society, v.50, no.4, pp 1141 - 1146Publisher한국물리학회
SCIESCOPUS
Characteristics of Ti-capped Co films deposited by a remote plasma ALD method using cyclopentadienylcobalt dicarbonylGo to Link

Lee, Keunwoo; Kim, Keunjun; Park, Taeyong; Jeon, Hyeongtag; Lee, Youngjin; Kim, Jeongtae; Yeom, Seungjin

ArticleIssue Date2007CitationJournal of the Electrochemical Society, v.154, no.10, pp H899 - H903PublisherElectrochemical Society, Inc.
SCIESCOPUS
Comparison of co films deposited by remote plasma atomic layer deposition method with cyclopentadienylcobalt dicarbonyl [CpCo(CO)(2)] and dicobalt octacarbonyl [Co-2(CO)(8)]Go to Link

Kim, Keunjun; Lee, Keunwoo; Han, Sejin; Park, Taeyong; Lee, Youngjin; Kim, Jeongtae; Yeom, Seungjin; Jeon, Hyeongtag

ArticleIssue Date2007CitationJapanese Journal of Applied Physics, v.46, no.8-11, pp L173 - L176PublisherIOP Publishing Ltd
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