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Inverse design of high-NA metalens for maskless lithography Go to Link open access

Chung, Haejun; Zhang, Feng; Li, Hao; Miller, Owen D. D.; Smith, Henry I. I.

ArticleIssue Date2023CitationNanophotonics, v.12, no.13, pp 2371 - 2381PublisherWALTER DE GRUYTER GMBH

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Browsing by Zhang, FengAuthor

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