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Electrostatically Driven Nanoelectromechanical Logical Gates Utilising Selective Tungsten Chemical Vapor DepositionGo to Link

Nguyen Van Toon; Zhao, Dong; Inomata, Naoki; Toda, Masaya; Song, Yun Heub; Ono, Takahito

ArticleIssue Date2019CitationPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, v.216, no.14, pp.1 - 8PublisherWILEY-V C H VERLAG GMBH
SCOPUS
Nanoelectromechanical Logical Gates Utilising Selective Tungsten Chemical Vapor DepositionGo to Link

Toan, Nguyen Van; Zhao, Dong; Inomata, Naoki; Toda, Masaya; Song, Yun Heub; Ono, Takahito

ArticleIssue Date2019CitationInternational Solid-State Sensors, Actuators and Microsystems Conference, pp 1709 - 1711PublisherIEEE
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