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Enhanced Characteristics of HfO2 Deposited by Atomic Layer Deposition Using Novel Precursor with Improved Thermal Stability
- Authors
- 안지훈
- Issue Date
- 20211109
- Place
- 제주도
- Conference Name
- ICAE 2021
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Collections - 서울 의과대학 > 서울 내과학교실 > 1. Journal Articles
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Related Researcher
- Ahn, Ji Hoon
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)