Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Performance of Extreme Ultraviolet Coherent Scattering Microscope
- Authors
- Kim, Young Woong; Woo, Dong Gon; Ahn, Jinho
- Issue Date
- Oct-2019
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- Keywords
- Extreme Ultraviolet Lithography; Actinic; Metrology; Coherent Diffractive Imaging
- Citation
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.19, no.10, pp.6463 - 6467
- Indexed
- SCIE
- Journal Title
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
- Volume
- 19
- Number
- 10
- Start Page
- 6463
- End Page
- 6467
- ISSN
- 1533-4880
- Abstract
- For the successful implementation of extreme ultraviolet lithography (EUVL) into high-volume manufacturing, the development of a novel structure mask for resolution improvement is essential. In this paper, coherent scattering microscopy (CSM) is introduced as an actinic metrology technique based on coherent diffractive imaging (CDI) for EUV mask development. CDI reconstructs the mask image using diffraction patterns from the mask through mathematical calculations. CSM can analyze details of an EUV mask such as its diffraction efficiency and phase information.
- Files in This Item
- Go to Link
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)