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On ev and ve-Degree Based Topological Indices of Silicon Carbides

Authors
Lee, Jung RyeHussain, AftabFahad, AsfandRaza, AliQureshi, Muhammad ImranMahboob, AbidPark, Choonkil
Issue Date
Jan-2022
Publisher
TECH SCIENCE PRESS
Keywords
Topological indices; silicon carbide; ev-degree; ve-degree
Citation
CMES-COMPUTER MODELING IN ENGINEERING & SCIENCES, v.130, no.2, pp.871 - 885
Indexed
SCIE
SCOPUS
Journal Title
CMES-COMPUTER MODELING IN ENGINEERING & SCIENCES
Volume
130
Number
2
Start Page
871
End Page
885
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/138444
DOI
10.32604/cmes.2022.016836
ISSN
1526-1492
Abstract
In quantitative structure-property relationship (QSPR) and quantitative structure-activity relationship (QSAR) studies, computation of topological indices is a vital tool to predict biochemical and physio-chemical properties of chemical structures. Numerous topological indices have been inaugurated to describe different topological features. The ev and ve-degree are recently introduced novelties, having stronger prediction ability. In this article, we derive formulae of the ev-degree and ve-degree based topological indices for chemical structure of Si2C3 - I[a,b].
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