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Highly Reliable Selection Behavior with Controlled Ag Doping of Nano-polycrystalline ZnO Layer for 3D X-Point Framework

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dc.contributor.authorSahota, Akshay-
dc.contributor.authorKim, Harrison Sejoon-
dc.contributor.authorMohan, Jaidah-
dc.contributor.authorJung, Yong Chan-
dc.contributor.authorHernandez-Arriaga, Heber-
dc.contributor.authorLe, Dan N.-
dc.contributor.authorKim,Si Joon-
dc.contributor.authorLee, Jang-Sik-
dc.contributor.authorAhn, Jinho-
dc.contributor.authorKim, Jiyoung-
dc.date.accessioned2022-07-06T02:16:08Z-
dc.date.available2022-07-06T02:16:08Z-
dc.date.created2022-01-05-
dc.date.issued2022-01-
dc.identifier.issn0741-3106-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/138470-
dc.description.abstractIn this letter, a threshold switching (TS) selector with Ag doping-based nano-polycrystalline ZnO switching layer (SL) having (002) preferred orientation has been manifested, without incorporating an active Ag metal layer, using a facile co-sputtering deposition technique. The TS selectors with extremely controlled doping of ~0.14 at. % Ag concentration showed remarkable electroforming (EF)-free selection behavior such as gigantic selectivity (~10 11 ), extreme-low off -current (~10 fA), high on -current density (~1.6 MA/cm 2 ), ultra-steep switching slope (~0.8 mV/decade), satisfactory endurance (>10 6 ), fast switch- on speed (~38 ns) and relaxation speed (~64 ns), and high device yield (~90%). Furthermore, selector devices showed reproducible selection behavior with stable threshold voltage (V th ) having merely ~8% variances.-
dc.language영어-
dc.language.isoen-
dc.publisherInstitute of Electrical and Electronics Engineers Inc.-
dc.titleHighly Reliable Selection Behavior with Controlled Ag Doping of Nano-polycrystalline ZnO Layer for 3D X-Point Framework-
dc.typeArticle-
dc.contributor.affiliatedAuthorAhn, Jinho-
dc.identifier.doi10.1109/LED.2021.3130828-
dc.identifier.scopusid2-s2.0-85120579531-
dc.identifier.wosid000736740500009-
dc.identifier.bibliographicCitationIEEE Electron Device Letters, v.43, no.1, pp.21 - 24-
dc.relation.isPartOfIEEE Electron Device Letters-
dc.citation.titleIEEE Electron Device Letters-
dc.citation.volume43-
dc.citation.number1-
dc.citation.startPage21-
dc.citation.endPage24-
dc.type.rimsART-
dc.type.docTypeArticle in Press-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.subject.keywordPlusTHRESHOLD SWITCH-
dc.subject.keywordAuthorThreshold switching selector-
dc.subject.keywordAuthorsputtering-
dc.subject.keywordAuthorpolycrystalline ZnO-
dc.subject.keywordAuthordoping-
dc.subject.keywordAuthor1S1R-
dc.subject.keywordAuthor3D X-Point-
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