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Sputter-grown GeTe/Sb2Te3 superlattice interfacial phase change memory for low power and multi-level-cell operation

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dc.contributor.authorJin, Soo-Min-
dc.contributor.authorKang, Shin-Young-
dc.contributor.authorKim, Hea-Jee-
dc.contributor.authorLee, Ju-Young-
dc.contributor.authorNam, In-Ho-
dc.contributor.authorShim, Tae-Hun-
dc.contributor.authorSong, Yun-Heub-
dc.contributor.authorPark, Jea-Gun-
dc.date.accessioned2022-07-06T10:47:48Z-
dc.date.available2022-07-06T10:47:48Z-
dc.date.created2021-12-08-
dc.date.issued2022-01-
dc.identifier.issn0013-5194-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/139927-
dc.description.abstractThe multi-level feature of GeTe/Sb2Te3 interfacial phase change memory was achieved by applying a designed voltage-based pulse. It stably demonstrated five multi-level states without interference for 90 cycles by varying the pulse width. GeTe/Sb2Te3 interfacial phase change memory demonstrated retention time of > 1.0 x 10(3) s, presenting the significantly low drift coefficient (nu) of < 0.009, indicating no resistivity drift due to the structure relaxation of glass. In addition, the reset energy consumption of GeTe/Sb2Te3 interfacial phase change memory was reduced by more than 85% compared to conventional Ge2Sb2Te5 phase change memory at each bottom electrode contact size. Multi-level-cell operation mechanism and gradual increase in conductance value of GeTe/Sb2Te3 interfacial phase change memory was explained by a partial resistance transition model where phase transition occurred partially in all layers. The result of the GeTe/Sb2Te3 interfacial phase change memory performance is expected to bring great advantages to the next-generation storage class memory industry that requires low energy and high density.-
dc.language영어-
dc.language.isoen-
dc.publisherWILEY-
dc.titleSputter-grown GeTe/Sb2Te3 superlattice interfacial phase change memory for low power and multi-level-cell operation-
dc.typeArticle-
dc.contributor.affiliatedAuthorSong, Yun-Heub-
dc.contributor.affiliatedAuthorPark, Jea-Gun-
dc.identifier.doi10.1049/ell2.12337-
dc.identifier.scopusid2-s2.0-85125598314-
dc.identifier.wosid000706105500001-
dc.identifier.bibliographicCitationELECTRONICS LETTERS, v.58, no.1, pp.38 - 40-
dc.relation.isPartOfELECTRONICS LETTERS-
dc.citation.titleELECTRONICS LETTERS-
dc.citation.volume58-
dc.citation.number1-
dc.citation.startPage38-
dc.citation.endPage40-
dc.type.rimsART-
dc.type.docTypeArticle; Early Access-
dc.description.journalClass1-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.subject.keywordPlusAntimony compounds-
dc.subject.keywordPlusEnergy utilization-
dc.subject.keywordPlusGermanium alloys-
dc.subject.keywordPlusGermanium compounds-
dc.subject.keywordPlusTellurium compounds-
dc.subject.keywordPlusPhase change memory-
dc.subject.keywordPlusCell operation-
dc.subject.keywordPlusDrift coefficient-
dc.subject.keywordPlusInterfacial phase-
dc.subject.keywordPlusLow Power-
dc.subject.keywordPlusMultilevels-
dc.subject.keywordPlusPhase-change memory-
dc.subject.keywordPlusPower levels-
dc.subject.keywordPlusPulsewidths-
dc.subject.keywordPlusPulswidths-
dc.subject.keywordPlusRetention time-
dc.identifier.urlhttps://ietresearch.onlinelibrary.wiley.com/doi/10.1049/ell2.12337-
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