High Field-Effect Mobility Two-Channel InGaZnO Thin-Film Transistors for Low-Voltage Operation
DC Field | Value | Language |
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dc.contributor.author | Yun, Kwang-Ro | - |
dc.contributor.author | Lee, Hwa-Seub | - |
dc.contributor.author | Kim, Jong-Ho | - |
dc.contributor.author | Lee, Tae-Ju | - |
dc.contributor.author | Park, Jin-Seong | - |
dc.contributor.author | Seong, Tae-Yeon | - |
dc.date.accessioned | 2022-07-06T11:05:59Z | - |
dc.date.available | 2022-07-06T11:05:59Z | - |
dc.date.created | 2021-12-08 | - |
dc.date.issued | 2021-12 | - |
dc.identifier.issn | 0018-9383 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/140175 | - |
dc.description.abstract | In this study, two-channel thin-film transistors (TC TFTs) using sputtered-deposited amorphous indium-gallium-zinc oxide (a-IGZO) as a channel layer and atomic-layer-deposition Al2O3 as gate insulator (GI) are proposed for wearable and portable device application. Symmetric-TC (S-TC) TFT structure consisted of conventional bottom gate (BG) TFT stacked on top of top gate (TG) TFT. Asymmetric-TC (A-TC) TFT contained BG TFT with tandem structure on the TG TFT. It was shown that the TC TFTs exhibited excellent performance such as high field-effect mobility (mu FE) and (ON/OFF) current ratio (I-ON/OFF) at low voltages (<2 V). For instance, the S-TC TFTs gave mu(FE) of 19.67 cm(2)Vs and I/(ON/OFF) of 5.48 x 10(8). Furthermore, the A-TC TFTs with tandem structure yielded mu(FE) of 30.15 cm(2)/Vs, a small threshold voltage of -1.25, a low subthreshold swing of 89 mV/decade, and a high knoFF of 1.70 x 10(9). It was found that the TC TFTs demonstrated better electrical performance than the sum of individual TG and BG TFTs. Under bias stress tests, the TC TFTs experience less V-th shift (Delta V-th) than the TG and BG TFTs. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | Institute of Electrical and Electronics Engineers Inc. | - |
dc.title | High Field-Effect Mobility Two-Channel InGaZnO Thin-Film Transistors for Low-Voltage Operation | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Park, Jin-Seong | - |
dc.identifier.doi | 10.1109/TED.2021.3120708 | - |
dc.identifier.scopusid | 2-s2.0-85118566426 | - |
dc.identifier.wosid | 000724501000036 | - |
dc.identifier.bibliographicCitation | IEEE Transactions on Electron Devices, v.68, no.12, pp.6166 - 6170 | - |
dc.relation.isPartOf | IEEE Transactions on Electron Devices | - |
dc.citation.title | IEEE Transactions on Electron Devices | - |
dc.citation.volume | 68 | - |
dc.citation.number | 12 | - |
dc.citation.startPage | 6166 | - |
dc.citation.endPage | 6170 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | TEMPERATURE FABRICATION | - |
dc.subject.keywordPlus | LAYER | - |
dc.subject.keywordPlus | TFTS | - |
dc.subject.keywordAuthor | Amorphous indium-gallium-zinc oxide (a-IGZO) | - |
dc.subject.keywordAuthor | field-effect mobility | - |
dc.subject.keywordAuthor | Iron | - |
dc.subject.keywordAuthor | Logic gates | - |
dc.subject.keywordAuthor | Low voltage | - |
dc.subject.keywordAuthor | low-voltage operation | - |
dc.subject.keywordAuthor | NIST | - |
dc.subject.keywordAuthor | Stress | - |
dc.subject.keywordAuthor | Thermal stability | - |
dc.subject.keywordAuthor | Thin film transistors | - |
dc.subject.keywordAuthor | two-channel thin-film transistor (TC TFTs). | - |
dc.identifier.url | https://ieeexplore.ieee.org/document/9586064 | - |
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