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Gate-controlled MoTe2 homojunction for sub-thermionic subthreshold swing tunnel field-effect transistor

Authors
Duong, Ngoc ThanhPark, ChulhoNguyen, Duc HieuNguyen, Phuong HuyenTran, Thi UyenPark, Dae YoungLee, JuchanNguyen, Duc AnhOh, Jong HyeokYu, Yun SeopJeong, Mun Seok
Issue Date
Oct-2021
Publisher
Elsevier B.V.
Keywords
Band-to-band tunneling; Gate-controlled homojunction; Sub-thermionic subthreshold swing; Transition metal dichalcogenides; Tunnel field-effect transistor
Citation
Nano Today, v.40, pp 1 - 10
Pages
10
Indexed
SCIE
SCOPUS
Journal Title
Nano Today
Volume
40
Start Page
1
End Page
10
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/140886
DOI
10.1016/j.nantod.2021.101263
ISSN
1748-0132
1878-044X
Abstract
A tunnel field-effect transistor (TFET) activated by a quantum band-to-band tunneling mechanism has encouraged the acceleration of nanodevices owing to its capability to beat the thermionic emission limit of a subthreshold swing (SS) (60 mV dec−1) in conventional metal-oxide-semiconductor FETs. Despite numerous studies, fabricating a TFET based on two-dimensional materials remain several major concerns due to factors such as a low on–off current ratio, weak air stability, and large hysteresis. Herein, we developed a MoTe2 homojunction-based TFET with bottom metal contacts and a defect-free polymer substrate. The transfer characteristic shows a sub-thermionic minimum SS of 36.4 mV dec−1 and SS average over four decades of 46 mV dec−1 at 300 K, with negligible hysteresis. In particular, a smaller supply voltage of 0.6 V (vs. 0.7 V for Silicon technology) is realized in the TFET. Furthermore, our device exhibits an excellent on/off current ratio of ~108, strong air stability for a period of over several months and a sub-Boltzmann limit, body factor of m = 0.21. This study demonstrates a strategy for a van der Waals heterostructure assembly and describes the considerable progress in TFET research.
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