Highly stable perpendicular magnetic anisotropies of CoFeB/MgO frames employing W buffer and capping layers
DC Field | Value | Language |
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dc.contributor.author | An, Gwang Guk | - |
dc.contributor.author | Lee, Ja Bin | - |
dc.contributor.author | Yang, Seung Mo | - |
dc.contributor.author | Kim, Jae Hong | - |
dc.contributor.author | Chung, Woo Seong | - |
dc.contributor.author | Hong, Jin Pyo | - |
dc.date.accessioned | 2022-07-07T04:40:02Z | - |
dc.date.available | 2022-07-07T04:40:02Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2015-04 | - |
dc.identifier.issn | 1359-6454 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/143215 | - |
dc.description.abstract | Typical CoFeB/MgO frames ensuring interface perpendicular magnetic anisotropy (PMA) features are one of the most reliable building blocks to meet the demand of PMA-based memory devices. However, employing the CoFeB/MgO frame with a Ta buffer layer has been restricted by the rapid PMA degradation that occurs during annealing at temperatures greater than 300 degrees C and the need of an ultrathin CoFeB layer of approximately 1.3 nm. Thus, the ability to enhance thermally strong PMA characteristics is still a key step toward extending their use. Here, we examine the effect of W layers on PMA features through both W buffer/CoFeB/MgO and MgO/CeFeB/W capping frames at various annealing temperatures. Highly stable PMA was achieved up to 450 degrees C at a specific W thickness, along with the presence of the dominant PMA properties at a relatively thick CoFeB greater than 1.3 nm and the achievement of a high K-eff of approximately 5 Merg/cc. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | PERGAMON-ELSEVIER SCIENCE LTD | - |
dc.title | Highly stable perpendicular magnetic anisotropies of CoFeB/MgO frames employing W buffer and capping layers | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Hong, Jin Pyo | - |
dc.identifier.doi | 10.1016/j.actamat.2015.01.022 | - |
dc.identifier.scopusid | 2-s2.0-84921994573 | - |
dc.identifier.wosid | 000350517700025 | - |
dc.identifier.bibliographicCitation | ACTA MATERIALIA, v.87, pp.259 - 265 | - |
dc.relation.isPartOf | ACTA MATERIALIA | - |
dc.citation.title | ACTA MATERIALIA | - |
dc.citation.volume | 87 | - |
dc.citation.startPage | 259 | - |
dc.citation.endPage | 265 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Metallurgy & Metallurgical Engineering | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Metallurgy & Metallurgical Engineering | - |
dc.subject.keywordPlus | ROOM-TEMPERATURE | - |
dc.subject.keywordPlus | MAGNETORESISTANCE | - |
dc.subject.keywordAuthor | Perpendicular magnetic anisotropy (PMA) | - |
dc.subject.keywordAuthor | Interface anisotropy | - |
dc.subject.keywordAuthor | CoFeB/MgO | - |
dc.subject.keywordAuthor | Annealing stability | - |
dc.subject.keywordAuthor | B diffusion | - |
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