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Relationship between the discharge mode and the spatial oxygen plasma distribution in a large size ferrite inductively coupled plasmas

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dc.contributor.authorKim, Hyun Jun-
dc.contributor.authorHwang, Hye Ju-
dc.contributor.authorKim, Dong Hwan-
dc.contributor.authorCho, Jeong Hee-
dc.contributor.authorChae, Hee Sun-
dc.contributor.authorChung, Chin-Wook-
dc.date.accessioned2022-07-07T05:43:10Z-
dc.date.available2022-07-07T05:43:10Z-
dc.date.issued2015-04-
dc.identifier.issn1070-664X-
dc.identifier.issn1089-7674-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/143557-
dc.description.abstractThe electrical characteristics and the spatial distribution of oxygen plasma according to the number of turns in ferrite inductively coupled plasmas (ferrite ICPs) are investigated. Through a new ICP model, which includes the capacitive coupling and the power loss of the ferrite material with the conventional ICP model, the variation of the oxygen discharge characteristics depending on the number of turns is simply understood by the electrical measurement, such as the antenna voltages and the currents. As the number of the turns increases, the capacitive coupling dominantly affects the spatial plasma distribution. This capacitive coupling results in a center focused density profile along the radial direction. In spite of the same discharge conditions (discharge chamber, neutral gas, and pressure), the spatial plasma distribution over 450mm has drastic changes by increasing number of the turns. In addition, the effect of the negative species to the density profile is compared with the argon discharge characteristics at the same discharge configuration.-
dc.format.extent8-
dc.language영어-
dc.language.isoENG-
dc.publisherAmerican Institute of Physics-
dc.titleRelationship between the discharge mode and the spatial oxygen plasma distribution in a large size ferrite inductively coupled plasmas-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1063/1.4916957-
dc.identifier.scopusid2-s2.0-84927643869-
dc.identifier.wosid000353837200088-
dc.identifier.bibliographicCitationPhysics of Plasmas, v.22, no.4, pp 1 - 8-
dc.citation.titlePhysics of Plasmas-
dc.citation.volume22-
dc.citation.number4-
dc.citation.startPage1-
dc.citation.endPage8-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Fluids & Plasmas-
dc.subject.keywordPlusHIGH-POWER-
dc.subject.keywordPlusDENSITY-
dc.subject.keywordPlusELECTRONEGATIVITY-
dc.subject.keywordPlusTERMINATION-
dc.subject.keywordPlusANTENNA-
dc.identifier.urlhttps://aip.scitation.org/doi/10.1063/1.4916957-
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