Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Young-Cheol | - |
| dc.contributor.author | Lee, Hyo-Chang | - |
| dc.contributor.author | Chung, Chin-Wook | - |
| dc.date.accessioned | 2022-07-07T13:28:56Z | - |
| dc.date.available | 2022-07-07T13:28:56Z | - |
| dc.date.issued | 2014-10 | - |
| dc.identifier.issn | 0093-3813 | - |
| dc.identifier.issn | 1939-9375 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/144498 | - |
| dc.description.abstract | In this paper, 2-D plasma density profile is measured in an inductively coupled plasma (ICP) with changing rf power and gas pressure. As the ICP power increases at a fixed argon gas pressure of 100 mtorr, increase in the plasma density is observed at the radial edge. It could be understood by the neutral gas depletion in the discharge center and the step-ionization effect. | - |
| dc.format.extent | 2 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Institute of Electrical and Electronics Engineers | - |
| dc.title | Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1109/TPS.2014.2331362 | - |
| dc.identifier.scopusid | 2-s2.0-85028105573 | - |
| dc.identifier.wosid | 000344548300267 | - |
| dc.identifier.bibliographicCitation | IEEE Transactions on Plasma Science, v.42, no.10, pp 2858 - 2859 | - |
| dc.citation.title | IEEE Transactions on Plasma Science | - |
| dc.citation.volume | 42 | - |
| dc.citation.number | 10 | - |
| dc.citation.startPage | 2858 | - |
| dc.citation.endPage | 2859 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Physics, Fluids & Plasmas | - |
| dc.subject.keywordPlus | Argon | - |
| dc.subject.keywordPlus | Electric discharges | - |
| dc.subject.keywordPlus | Ionization of gases | - |
| dc.subject.keywordPlus | Plasma density | - |
| dc.subject.keywordPlus | Inductively coupled plasma | - |
| dc.subject.keywordPlus | 2-D measurements | - |
| dc.subject.keywordPlus | Argon gas pressure | - |
| dc.subject.keywordPlus | Density profile | - |
| dc.subject.keywordPlus | ICP | - |
| dc.subject.keywordPlus | Inductively coupled plasma (ICP) | - |
| dc.subject.keywordPlus | Ionization effect | - |
| dc.subject.keywordPlus | Neutral gas | - |
| dc.subject.keywordPlus | Plasma uniformity | - |
| dc.subject.keywordAuthor | ICP | - |
| dc.subject.keywordAuthor | neutral gas depletion | - |
| dc.subject.keywordAuthor | plasma uniformity | - |
| dc.identifier.url | https://ieeexplore.ieee.org/document/6884864 | - |
- Files in This Item
- Go to Link
- Appears in
Collections - 서울 공과대학 > 서울 전기공학전공 > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)