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Enhanced Plasma Uniformity in RF Plasma With Side Multihole
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee, Hyo-Chang | - |
| dc.contributor.author | Chung, Chin-Wook | - |
| dc.date.accessioned | 2022-07-07T13:28:59Z | - |
| dc.date.available | 2022-07-07T13:28:59Z | - |
| dc.date.issued | 2014-10 | - |
| dc.identifier.issn | 0093-3813 | - |
| dc.identifier.issn | 1939-9375 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/144499 | - |
| dc.description.abstract | Capacitively coupled plasma source with side multihole is studied. Due to the hollow cathode effect at the multihole, edge plasma density is strongly increased and thus, plasma uniformity is significantly enhanced. | - |
| dc.format.extent | 2 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Institute of Electrical and Electronics Engineers | - |
| dc.title | Enhanced Plasma Uniformity in RF Plasma With Side Multihole | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1109/TPS.2014.2331680 | - |
| dc.identifier.scopusid | 2-s2.0-84908416002 | - |
| dc.identifier.wosid | 000344548300221 | - |
| dc.identifier.bibliographicCitation | IEEE Transactions on Plasma Science, v.42, no.10, pp 2766 - 2767 | - |
| dc.citation.title | IEEE Transactions on Plasma Science | - |
| dc.citation.volume | 42 | - |
| dc.citation.number | 10 | - |
| dc.citation.startPage | 2766 | - |
| dc.citation.endPage | 2767 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Physics, Fluids & Plasmas | - |
| dc.subject.keywordPlus | DISCHARGES | - |
| dc.subject.keywordAuthor | Capacitively coupled plasma (CCP) | - |
| dc.subject.keywordAuthor | hollow cathode | - |
| dc.subject.keywordAuthor | plasma uniformity | - |
| dc.subject.keywordAuthor | radio-frequency (RF) gas discharge | - |
| dc.identifier.url | https://ieeexplore.ieee.org/document/6850019 | - |
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)