Detailed Information

Cited 1 time in webofscience Cited 1 time in scopus
Metadata Downloads

Experimental observation of the effect of electron attachment and detachment reactions on the electron energy distribution in an inductive oxygen discharge

Full metadata record
DC Field Value Language
dc.contributor.authorJung, Jiwon-
dc.contributor.authorLee, Moo-Young-
dc.contributor.authorKim, Kyung-Hyun-
dc.contributor.authorChung, Chin-Wook-
dc.date.accessioned2022-07-07T14:36:26Z-
dc.date.available2022-07-07T14:36:26Z-
dc.date.created2021-05-11-
dc.date.issued2020-10-
dc.identifier.issn1070-664X-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/145063-
dc.description.abstractElectron energy distribution functions (EEDFs) are measured with varying radio-frequency (RF) power in an oxygen inductive discharge. At a pressure of 10 mTorr, the EEDF has a Maxwellian distribution, and the low-energy (1-5 eV) electron temperature, T e, low, monotonically decreases with RF power. However, at a pressure of 100 mTorr, T e,low increases at low RF power (80-150 W) and decreases at high RF power (150-300 W), and the EEDF has a Druyvesteyn-like distribution. These changes in T e, low are attributed to electron attachment and detachment reactions, which are the main creation and loss reactions of negative ions. To investigate this relationship between T e, low and collisional reactions, the reaction coefficients of several reactions are calculated, and the electronegativity (α) is measured with varying RF power. The EEDF is modified by electron attachment and detachment reactions, which lead to a change in T e, low; this modification of EEDF is supported by calculated reaction coefficients and measured α.-
dc.language영어-
dc.language.isoen-
dc.publisherAMER INST PHYSICS-
dc.titleExperimental observation of the effect of electron attachment and detachment reactions on the electron energy distribution in an inductive oxygen discharge-
dc.typeArticle-
dc.contributor.affiliatedAuthorChung, Chin-Wook-
dc.identifier.doi10.1063/5.0005003-
dc.identifier.scopusid2-s2.0-85092372989-
dc.identifier.wosid000578486600001-
dc.identifier.bibliographicCitationPHYSICS OF PLASMAS, v.27, no.10, pp.1 - 8-
dc.relation.isPartOfPHYSICS OF PLASMAS-
dc.citation.titlePHYSICS OF PLASMAS-
dc.citation.volume27-
dc.citation.number10-
dc.citation.startPage1-
dc.citation.endPage8-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Fluids & Plasmas-
dc.subject.keywordPlusMODEL-
dc.identifier.urlhttps://aip.scitation.org/doi/10.1063/5.0005003-
Files in This Item
Go to Link
Appears in
Collections
서울 공과대학 > 서울 전기공학전공 > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Chung, Chin Wook photo

Chung, Chin Wook
COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)
Read more

Altmetrics

Total Views & Downloads

BROWSE