Highly Ordered Microscale-Pyramidal-Structure-Arrayed Silicon Membranes for Filter Applications
- Authors
- Hwang, Shinae; Lee, Seongjae; Ko, Jaehyeon; Jang, Moongyu
- Issue Date
- Sep-2018
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- Keywords
- KOH Etching; Pyramidal Structure; Membrane; Filter
- Citation
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.18, no.9, pp.6270 - 6273
- Indexed
- SCIE
- Journal Title
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
- Volume
- 18
- Number
- 9
- Start Page
- 6270
- End Page
- 6273
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/149414
- DOI
- 10.1166/jnn.2018.15626
- ISSN
- 1533-4880
- Abstract
- Microscale-pyramidal-structure-arrayed patterned silicon membranes are manufactured using semiconductor processes and potassium hydroxide (KOH) etching techniques for filter applications. The silicon nitride on silicon on the insulator wafer functions as a masking layer, and the roughness of the silicon (100) plane strongly depends on the etching temperature and KOH concentration. To fabricate the membrane filter, a series of dry and wet etching using 45 wt% KOH solutions at the constant temperature of 70 degrees C was performed. With the dry and wet etching, micro-pyramidal arrays with 300 mu m top and 16-20 mu m bottom opening sizes were created. The morphological structures were analyzed using scanning electron microscopy. The manufactured membranes were tested as optical directional filters and particle filters.
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