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Perovskite Nanoparticle Composite Films by Size Exclusion Lithography
- Authors
- Minh, Duong Nguyen; Eom, Sangwon; Nguyen, Lan Anh Thi; Kim, Juwon; Sim, Jae Hyun; Seo, Chunhee; Nam, Jihye; Lee, Sangheon; Suk, Soyeon; Kim, Jaeyong; Kang, Youngjong
- Issue Date
- Sep-2018
- Publisher
- WILEY-V C H VERLAG GMBH
- Keywords
- composite; lithography; mass-transfer; perovskite; size exclusion
- Citation
- ADVANCED MATERIALS, v.30, no.39
- Indexed
- SCIE
SCOPUS
- Journal Title
- ADVANCED MATERIALS
- Volume
- 30
- Number
- 39
- ISSN
- 0935-9648
- Abstract
- Perovskite nanoparticle composite films with capability of high-resolution patterning (>= 2 mu m) and excellent resistance to various aqueous and organic solvents are prepared by in situ photosynthesis of acrylate polymers and formamidinium lead halide (FAPbX(3)) nanoparticles. Both positive- and negative-tone patterns of FAPbX(3) nanoparticles are created by controlling the size exclusive flow of nanoparticles in polymer networks. The position of nanoparticles is spatially controlled in both lateral and vertical directions. The composite films show high photoluminescence quantum yield (up to 44%) and broad color tunability in visible region (lambda(peak) = 465-630 nm).
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Related Researcher
- Kim, Jae yong
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF PHYSICS)