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Polymerizable Supramolecular Approach to Highly Conductive PEDOT:PSS Patterns

Authors
Kim, Tae GeunHa, Su RyongChoi, HyosungUh, KyungchanKundapur, UmeshaPark, SuminLee, Chan WooLee, Sang-hwaKim, JaeyongKim, Jong-Man
Issue Date
Jun-2017
Publisher
AMER CHEMICAL SOC
Keywords
PEDOT:PSS; Polydiacetylene; conducting polymer; pattern; photolithography
Citation
ACS APPLIED MATERIALS & INTERFACES, v.9, no.22, pp.19231 - 19237
Indexed
SCIE
SCOPUS
Journal Title
ACS APPLIED MATERIALS & INTERFACES
Volume
9
Number
22
Start Page
19231
End Page
19237
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/152279
DOI
10.1021/acsami.7b04284
ISSN
1944-8244
Abstract
Owing to its high conductivity, solution processability, mechanical flexibility, and transparency, poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) has been extensively explored for use in functional devices including solar cells, sensors, light-emitting diodes, and supercapacitors. The ability to fabricate patterned PEDOT:PSS on a solid substrate is of significant importance to develop practical applications of this conducting polymer. Herein, we describe a new approach to obtain PEDOT:PSS patterns that are based on a polymerizable supramolecular concept. Specifically, we found that UV irradiation of a photopolymerizable diacetylene containing PEDOT:PSS film followed by development in deionized water and subsequent treatment with sulfuric acid (glass and silicon wafer) or formic acid (PET) produces micron-sized PEDOT:PSS patterns on solid substrates. The newly designed photolithographic method, which can be employed to generate highly conductive (>1000 S/cm) PEDOT:PSS patterns, has many advantages including the use of aqueous process conditions, a reduced number of process steps, and no requirement for plasma etching procedures.
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서울 자연과학대학 > 서울 화학과 > 1. Journal Articles

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