Polymerizable Supramolecular Approach to Highly Conductive PEDOT:PSS Patterns
- Authors
- Kim, Tae Geun; Ha, Su Ryong; Choi, Hyosung; Uh, Kyungchan; Kundapur, Umesha; Park, Sumin; Lee, Chan Woo; Lee, Sang-hwa; Kim, Jaeyong; Kim, Jong-Man
- Issue Date
- Jun-2017
- Publisher
- AMER CHEMICAL SOC
- Keywords
- PEDOT:PSS; Polydiacetylene; conducting polymer; pattern; photolithography
- Citation
- ACS APPLIED MATERIALS & INTERFACES, v.9, no.22, pp.19231 - 19237
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS APPLIED MATERIALS & INTERFACES
- Volume
- 9
- Number
- 22
- Start Page
- 19231
- End Page
- 19237
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/152279
- DOI
- 10.1021/acsami.7b04284
- ISSN
- 1944-8244
- Abstract
- Owing to its high conductivity, solution processability, mechanical flexibility, and transparency, poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) has been extensively explored for use in functional devices including solar cells, sensors, light-emitting diodes, and supercapacitors. The ability to fabricate patterned PEDOT:PSS on a solid substrate is of significant importance to develop practical applications of this conducting polymer. Herein, we describe a new approach to obtain PEDOT:PSS patterns that are based on a polymerizable supramolecular concept. Specifically, we found that UV irradiation of a photopolymerizable diacetylene containing PEDOT:PSS film followed by development in deionized water and subsequent treatment with sulfuric acid (glass and silicon wafer) or formic acid (PET) produces micron-sized PEDOT:PSS patterns on solid substrates. The newly designed photolithographic method, which can be employed to generate highly conductive (>1000 S/cm) PEDOT:PSS patterns, has many advantages including the use of aqueous process conditions, a reduced number of process steps, and no requirement for plasma etching procedures.
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