Time-resolved spatial distribution measurements of pulse-modulated argon plasmas in an inductively coupled plasma reactor
DC Field | Value | Language |
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dc.contributor.author | Park, Ji-Hwan | - |
dc.contributor.author | Kim, Dong-Hwan | - |
dc.contributor.author | Kim, Yu-Sin | - |
dc.contributor.author | Chung, Chin-Wook | - |
dc.date.accessioned | 2022-07-14T04:08:08Z | - |
dc.date.available | 2022-07-14T04:08:08Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2017-05 | - |
dc.identifier.issn | 0963-0252 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/152430 | - |
dc.description.abstract | The time variation of the plasma parameters along with their spatial distributions were measured in pulse-modulated (PM) inductively coupled argon plasma via the phase delay harmonic analysis method (PDHAM). During the initial active-glow, the distributions of both the ion flux and the electron temperature in the plasma bulk have M-shaped profiles due to the antenna geometry. Then, while the plasma is approaching a steady state, the spatial distribution evolves into a profile with a convex shape. The effects of the antenna geometry and the time evolution on the distribution profile are lesser under low gas pressure, and diminish at the wafer level. The diffusion of the charged particles and the nonlocal electron kinetics account for these characteristics. It is observed that the initial distribution of the electron temperature is affected by the electron density distribution of the previous after-glow at the wafer level. The distribution profiles at different pulse frequencies were also measured. At higher pulse frequencies, the distribution profile is more frequently smoothed by diffusion during the after-glow, leading to higher uniformity. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.title | Time-resolved spatial distribution measurements of pulse-modulated argon plasmas in an inductively coupled plasma reactor | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Chung, Chin-Wook | - |
dc.identifier.doi | 10.1088/1361-6595/aa61c2 | - |
dc.identifier.scopusid | 2-s2.0-85018276495 | - |
dc.identifier.wosid | 000399278100001 | - |
dc.identifier.bibliographicCitation | PLASMA SOURCES SCIENCE & TECHNOLOGY, v.26, no.5 | - |
dc.relation.isPartOf | PLASMA SOURCES SCIENCE & TECHNOLOGY | - |
dc.citation.title | PLASMA SOURCES SCIENCE & TECHNOLOGY | - |
dc.citation.volume | 26 | - |
dc.citation.number | 5 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Fluids & Plasmas | - |
dc.subject.keywordPlus | ELECTRON-ENERGY DISTRIBUTION | - |
dc.subject.keywordPlus | MODERATE COMPUTATIONAL PARALLELISM | - |
dc.subject.keywordPlus | OPTICAL-EMISSION SPECTROSCOPY | - |
dc.subject.keywordPlus | LONG-TERM TRANSIENTS | - |
dc.subject.keywordPlus | SIMULATION | - |
dc.subject.keywordPlus | UNIFORMITY | - |
dc.subject.keywordPlus | PROBE | - |
dc.subject.keywordAuthor | pulse modulated plasma | - |
dc.subject.keywordAuthor | plasma diagnostics | - |
dc.subject.keywordAuthor | plasma parameter | - |
dc.subject.keywordAuthor | plasma distribution | - |
dc.subject.keywordAuthor | plasma uniformity | - |
dc.subject.keywordAuthor | inductively coupled plasma | - |
dc.identifier.url | https://iopscience.iop.org/article/10.1088/1361-6595/aa61c2 | - |
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