Fine-Tunable Absorption of Uniformly Aligned Polyurea Thin Films for Optical Filters Using Sequentially Self-Limited Molecular Layer Deposition
- Authors
- Park, Yi-Seul; Choi, Sung-Eun; Kim, Hyein; Lee, Jin Seok
- Issue Date
- May-2016
- Publisher
- AMER CHEMICAL SOC
- Keywords
- molecular layer deposition; self-limiting surface reaction; alignment; polyurea; fine resonance
- Citation
- ACS APPLIED MATERIALS & INTERFACES, v.8, no.18, pp.11788 - 11795
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS APPLIED MATERIALS & INTERFACES
- Volume
- 8
- Number
- 18
- Start Page
- 11788
- End Page
- 11795
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/154627
- DOI
- 10.1021/acsami.6b02142
- ISSN
- 1944-8244
- Abstract
- Development of methods enabling the preparation of uniformly aligned polymer thin films at the molecular level is a prerequisite for realizing their optoelectronic characteristics as innovative materials; however, these methods often involve a compromise between scalability and accuracy. In this study, we have grown uniformly aligned polyurea thin films on a SiO2 substrate using molecular layer deposition (MLD) based on sequential and self-limiting surface reactions. By integrating plane polarized Fourier-transform infrared, Raman spectroscopic tools, and density functional theory calculations, we demonstrated the uniform alignment of polyurea MLD films. Furthermore, the selective-wavelength absorption characteristics of thickness controlled MLD films were investigated by integrating optical measurements and finite-difference time-domain simulations of reflection spectra, resulting from their thickness-dependent fine resonance with photons, which could be used as color filters in optoelectronics.
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