Comparative studies on the physical and electronic properties of reactively sputtered ZnO and ZnON semiconductors
DC Field | Value | Language |
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dc.contributor.author | Ok, Kyung-Chul | - |
dc.contributor.author | Jeong, Hyun-Jun | - |
dc.contributor.author | Lee, Hyun-Mo | - |
dc.contributor.author | Park, Jozeph | - |
dc.contributor.author | Park, Jin-Seong | - |
dc.date.accessioned | 2022-07-15T19:57:44Z | - |
dc.date.available | 2022-07-15T19:57:44Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2015-12 | - |
dc.identifier.issn | 0272-8842 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/155699 | - |
dc.description.abstract | Thin film transistors were fabricated using ZnO and ZnON semiconductors grown by DC reactive sputtering. After low vacuum annealing at 250 degrees C, ZnON devices exhibit superior electrical performance (mu(sat)=56.3 cm(2)/Vs, Vth = -1.59 V, and SS =0.51 V/dec) in comparison with ZnO devices (mu(sat)= 0.99 cm2/Vs, Vth=3.28 V, and SS =1.22 V/dec). The physical and electronic structures in both materials were analyzed by X-ray diffraction and X-ray absorption spectroscopy, respectively. The chemical bonding states were also examined by X-ray photoelectron spectroscopy. Consequently, nitrogen incorporation in DC reactive sputtering is found to suppress crystallization and enhance electron transport by the formation of Zn-N bonds. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCI LTD | - |
dc.title | Comparative studies on the physical and electronic properties of reactively sputtered ZnO and ZnON semiconductors | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Park, Jin-Seong | - |
dc.identifier.doi | 10.1016/j.ceramint.2015.07.110 | - |
dc.identifier.scopusid | 2-s2.0-84955418235 | - |
dc.identifier.wosid | 000362860900094 | - |
dc.identifier.bibliographicCitation | CERAMICS INTERNATIONAL, v.41, no.10, pp.13281 - 13284 | - |
dc.relation.isPartOf | CERAMICS INTERNATIONAL | - |
dc.citation.title | CERAMICS INTERNATIONAL | - |
dc.citation.volume | 41 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | 13281 | - |
dc.citation.endPage | 13284 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Ceramics | - |
dc.subject.keywordPlus | THIN-FILM TRANSISTORS | - |
dc.subject.keywordPlus | HIGH-MOBILITY | - |
dc.subject.keywordPlus | NITROGEN | - |
dc.subject.keywordAuthor | ZnO | - |
dc.subject.keywordAuthor | ZnON | - |
dc.subject.keywordAuthor | Oxide semiconductor | - |
dc.subject.keywordAuthor | X-ray absorption | - |
dc.subject.keywordAuthor | Thin film transistor | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0272884215014005?via%3Dihub | - |
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